duoplasmatrons

A duoplasmatron is a type of ion source that produces a high-intensity, focused beam of ions. It consists of a discharge chamber where a plasma is generated and an extraction system to extract and accelerate the ions from the plasma. The discharge is typically initiated by a hot filament cathode, and the plasma is confined and compressed by a series of magnetic mirrors and an intermediate electrode. The intermediate electrode also serves to control the plasma density and ion beam current.

Duoplasmatrons are characterized by their ability to produce dense plasmas with high ionization efficiencies, leading to a high brightness ion beam. This makes them suitable for applications requiring a concentrated ion current. The ion species produced depends on the gas introduced into the discharge chamber. Common gases include hydrogen, deuterium, helium, argon, and various hydrocarbons.

The design of a duoplasmatron allows for tuning of parameters such as discharge pressure, magnetic field strength, and extraction voltage to optimize the ion beam properties for specific applications. These sources have been used in various fields, including ion implantation for semiconductor manufacturing, mass spectrometry, ion beam lithography, and fundamental plasma research. While effective, duoplasmatrons can have a limited operational lifetime due to filament erosion and can require careful maintenance. They are generally considered a mature technology within the ion source landscape.