atomlagavsetning
Atomlagavsetning, often translated as atomic layer deposition (ALD), is a thin-film deposition technique that enables the precise control of film thickness down to the atomic level. It is a gas-phase chemical deposition method that relies on sequential, self-limiting surface reactions. In ALD, precursors are introduced to a substrate surface in a pulsed manner, with each precursor reacting completely with the surface before the next precursor is introduced. This process ensures that the film grows layer by atomic layer, leading to highly conformal and uniform coatings.
The core principle of ALD involves two or more distinct precursor gases. Each precursor is pulsed into
ALD is widely used in various high-technology industries. Its ability to deposit ultra-thin, uniform, and conformal