Vákuumdepozíció

Vákuumdepozíció is a process used to deposit thin films onto a substrate under vacuum conditions. This technique is employed in various industries, including microelectronics, optics, and surface engineering, to create specialized coatings with unique properties. The vacuum environment is crucial to prevent contamination from atmospheric gases and to ensure the purity and uniformity of the deposited film.

There are several methods within vákuumdepozíció. Physical vapor deposition (PVD) involves the physical transfer of material from a source to the substrate. This can be achieved through evaporation, where the source material is heated until it vaporizes and then condenses on the cooler substrate, or sputtering, where ions bombard a target material, ejecting atoms that then deposit onto the substrate. Chemical vapor deposition (CVD) is another category, where volatile precursors react in the gas phase or on the substrate surface to form the desired thin film.

The thickness of the deposited films can range from a few nanometers to several micrometers. The properties of the film, such as its electrical conductivity, optical transparency, hardness, or chemical resistance, are determined by the choice of deposition method, source materials, substrate temperature, and process parameters. Vákuumdepozíció allows for precise control over film composition and structure, making it indispensable for advanced material fabrication.