Tolylsilane

Tolylsilane is an organosilicon compound with the chemical formula CH3C6H4SiH3. It is a derivative of silane (SiH4) where one hydrogen atom is replaced by a tolyl group. The tolyl group is a methyl-substituted phenyl ring, typically referring to either the ortho-tolyl, meta-tolyl, or para-tolyl isomer. The specific isomer will influence the precise properties of the tolylsilane.

This compound is a colorless liquid and is generally considered reactive. Organosilanes, in general, find applications as precursors in materials science, particularly for the deposition of silicon-containing thin films. The presence of the tolyl group can modify the reactivity and decomposition pathways compared to simple silanes. Tolylsilane can be synthesized through various organometallic reactions, often involving the reaction of a tolyl Grignard reagent or organolithium compound with a silicon halide.

In terms of its chemical behavior, the Si-H bonds in tolylsilane are susceptible to oxidation and can participate in hydrosilylation reactions, where they add across carbon-carbon double or triple bonds. The aromatic ring can also undergo electrophilic aromatic substitution. Due to its reactivity, tolylsilane is typically handled under inert atmosphere conditions to prevent degradation. Research into tolylsilanes often focuses on their potential use in chemical vapor deposition (CVD) processes for creating silicon carbide or silicon nitride films, or as intermediates in the synthesis of more complex organosilicon structures.