Sputterpinnoitus
Sputterpinnoitus is a term used in Finnish technical literature to describe the sputter coating process and the resulting thin film on a substrate. It denotes deposition of material from a solid target by energetic ions in a vacuum, typically via argon plasma.
In a sputter deposition system, a target material is bombarded by ions, ejecting atoms that travel to
Films deposited by sputterpinnoitus include metals, oxides, nitrides, and multilayer stacks. Typical thickness ranges span from
Performance depends on adhesion, density, and stress, which are influenced by substrate cleanliness, temperature, and bias,
Quality control relies on thickness and composition measurements (profilometry, X-ray reflectometry, ellipsometry, EDS), as well as