SiH3CH3

SiH3CH3, also known as trimethylsilane or methylsilane, is a chemical compound with the formula SiH3CH3. It is an organosilicon compound, meaning it contains silicon-carbon bonds. In this molecule, a silicon atom is bonded to three hydrogen atoms and one methyl group (CH3). The silicon atom has a tetrahedral geometry, similar to carbon in methane.

Trimethylsilane is a colorless gas at room temperature and pressure. It is flammable and can react with oxidizing agents. Its chemical reactivity is influenced by the presence of both silicon-hydrogen bonds and the silicon-carbon bond. The Si-H bonds are more polar than C-H bonds and can undergo various reactions, including hydrosilylation and substitution. The Si-C bond is relatively stable but can be cleaved under specific conditions.

This compound has found some applications as a precursor in the deposition of silicon-containing thin films via chemical vapor deposition (CVD) techniques. These films can possess unique electronic or optical properties depending on the deposition conditions. It can also serve as a building block in the synthesis of more complex organosilicon molecules. Its properties and reactivity make it a subject of interest in organosilicon chemistry research.