ALDlaitteet
ALDlaitteet is a term used in Finnish to refer to equipment or devices related to Atomic Layer Deposition (ALD). Atomic Layer Deposition is a thin-film deposition technique based on sequential, self-limiting surface reactions. It allows for the deposition of highly conformal and uniform thin films with precise atomic-level control over thickness and composition. ALD is widely used in various industries, including semiconductor manufacturing, for applications such as gate dielectrics, diffusion barriers, and protective coatings.
ALD equipment typically consists of a vacuum chamber where the deposition process takes place. It includes
The specific configuration of ALDlaitteet can vary depending on the application and the materials being deposited.