3Dnanolitografi

3D nanolithography refers to a set of techniques used to create three-dimensional structures at the nanoscale. This field merges principles from traditional lithography, which is used to pattern layers of material, with additive manufacturing processes that build up structures layer by layer. The goal is to achieve precise control over the geometry and placement of features with dimensions ranging from a few nanometers to hundreds of nanometers.

Various methods fall under the umbrella of 3D nanolithography. One common approach is two-photon polymerization (2PP), which utilizes a focused laser beam to initiate polymerization within a photosensitive resin. By scanning the laser in three dimensions, complex micro- and nanostructures can be fabricated directly from liquid precursors. Another technique is focused ion beam (FIB) milling, where a beam of ions is used to precisely remove material from a substrate, sculpting desired nanoscale features. Electron beam lithography (EBL), while primarily a 2D patterning technique, can be adapted for 3D fabrication through multiple exposure steps or by using resist profiles to define vertical structures.

The applications of 3D nanolithography are diverse and rapidly expanding. They include the creation of advanced optical components like photonic crystals and metamaterials, intricate microfluidic devices for biological and chemical analysis, novel sensor platforms, and scaffolds for tissue engineering. The ability to engineer complex three-dimensional architectures at the nanoscale opens up possibilities for developing next-generation technologies in fields such as electronics, photonics, and medicine.