vékonyrétegleválasztás

Vékonyrétegleválasztás, or thin-film deposition, refers to a variety of processes used to produce thin films, layers of material ranging from fractions of a nanometer to several micrometers in thickness. These films are deposited onto a substrate, which can be a solid material like glass, silicon, or metal. The purpose of thin-film deposition is to impart specific properties to the substrate surface, such as electrical conductivity, optical characteristics, or mechanical hardness.

There are two primary categories of thin-film deposition: physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD processes involve the physical transfer of material from a source to the substrate. Common PVD techniques include sputtering, where ions bombard a target material, ejecting atoms that then deposit onto the substrate, and evaporation, where a material is heated to a vapor phase and condenses on the substrate. CVD, on the other hand, utilizes chemical reactions. In these processes, precursor gases containing the desired film elements are introduced into a reaction chamber. These gases react or decompose on or near the substrate surface, forming the solid thin film.

The choice of deposition method depends on factors such as the desired film material, its thickness, the substrate type, and the required film properties. Thin-film deposition is a critical technology in many industries, including microelectronics for fabricating integrated circuits, optics for creating anti-reflective coatings and filters, and surface engineering for enhancing material performance.