fotoresistikiht

Fotoresistikiht is a light-sensitive material used in photolithography. It is typically a polymer dissolved in a solvent. When exposed to light of a specific wavelength, the chemical properties of the fotoresistikiht change. There are two main types: positive fotoresistikiht and negative fotoresistikiht. In positive fotoresistikiht, the areas exposed to light become soluble in a developer solution, while the unexposed areas remain insoluble. Conversely, in negative fotoresistikiht, the exposed areas become insoluble, and the unexposed areas are removed by the developer. This differential solubility allows for the selective removal of material, creating patterns on a substrate. Fotoresistikiht is a crucial component in the manufacturing of microelectronic devices, integrated circuits, and printed circuit boards. Its application involves coating a substrate with the fotoresistikiht, exposing it through a mask, and then developing the exposed areas. The remaining fotoresistikiht then acts as a protective layer during subsequent processing steps like etching or deposition. The precise control over the photoresist's properties and its interaction with light and developers is vital for achieving high-resolution patterns.