fotolitográfiás

Fotolitográfia is a process used in microfabrication to pattern a light-sensitive chemical, called a photoresist, on a surface. This patterned photoresist then serves as a mask for subsequent processing steps, such as etching or deposition of materials. The term itself is derived from Greek words: "photo" meaning light, "litho" meaning stone, and "graphy" meaning writing, essentially referring to "writing with light on a stone" or, more broadly, "light-based patterning."

The core of the photolithography process involves exposing the photoresist-coated substrate to ultraviolet (UV) light through a mask. This mask contains the desired pattern, acting like a stencil. The UV light causes a chemical change in the exposed areas of the photoresist. Depending on whether a positive or negative photoresist is used, either the exposed or unexposed areas will become soluble in a developer solution.

After development, the remaining photoresist defines the areas that will be protected during subsequent fabrication steps. For example, in semiconductor manufacturing, photolithography is crucial for creating the intricate circuit patterns on silicon wafers. It allows for the precise transfer of complex designs from a mask to the wafer surface, enabling the miniaturization and functionality of electronic devices. The resolution of photolithography is a key factor in determining the smallest features that can be created, and advancements in light sources (like extreme ultraviolet, EUV) and mask technology continue to push these limits.