fotobelægning

Fotobelægning, also known as photocoating or photoresist, is a light-sensitive material used in photolithography and other imaging processes. It is typically a polymer that undergoes a chemical change when exposed to light of a specific wavelength. This change alters the solubility of the material in a developer solution.

There are two main types of fotobelægning: positive and negative. In a positive fotobelægning, the exposed areas become more soluble and are removed by the developer, leaving the unexposed areas as the pattern. Conversely, in a negative fotobelægning, the exposed areas become less soluble and remain after development, while the unexposed areas are removed.

Fotobelægning is a critical component in the manufacturing of printed circuit boards (PCBs) and semiconductor devices, where it is used to transfer intricate patterns from a mask onto a substrate. The process involves applying a thin layer of fotobelægning to the substrate, exposing it through a mask, developing it to create a stencil, and then etching or depositing material in the open areas. After the desired pattern is formed, the remaining fotobelægning is stripped away. The precise control of fotobelægning properties, such as resolution and adhesion, is essential for achieving high-precision results in these advanced manufacturing techniques.