excimerlaserit

Excimerlaserit, or excimer laser, is a type of ultraviolet gas laser that uses excimer molecules formed from noble gas atoms and halogen partners. The term excimer derives from excited dimer. The laser emits ultraviolet light typically in the 193 nm (argon fluoride ArF), 248 nm (krypton fluoride KrF), and 308 nm (xenon chloride XeCl) ranges, with other lines such as 351 nm (XeF) available in some systems. The active medium is a mixture of a noble gas and a halogen gas; a fast electrical discharge creates excited molecules that decay to repulsive ground states, producing a short, high-peak-energy photon emission.

Pulsed operation yields nanosecond-duration pulses with high peak powers, enabling photochemical ablation of materials with minimal thermal diffusion. Excimer lasers are used in photolithography for deep ultraviolet imaging (notably 193 nm ArF for advanced semiconductor lithography), micromachining and surface structuring, and ophthalmology, especially corneal refractive surgery (PRK/LASIK) where tissue removal is highly localized.

In ophthalmology, the 193 nm excimer laser reshapes the cornea by ablation with minimal collateral heat, allowing precise correction of refractive errors. In manufacturing, they enable micromachining of polymers and glasses, as well as surface texturing. Systems require specialized gas handling, UV-grade optics, and protection against ultraviolet exposure; maintenance and gas-component degradation can affect stability and throughput.