Substratow1

Substratow1 is a modular substrate platform used in materials science and nanofabrication. It is designed to provide a stable, tunable base for thin-film deposition and device prototyping across a range of material systems, including oxides, nitrides, and organic semiconductors. The design aims to minimize interfacial defects by allowing control over lattice mismatch, thermal expansion, and surface chemistry.

Three-layer architecture characterizes Substratow1: a base, an interlayer, and a top coating. The base typically consists of a rigid ceramic such as alumina or silicon nitride, offering thermal stability and chemical inertness. The interlayer is a compliant polymer (for example, a cured polyimide) that buffers mismatches in thermal expansion. The top coating is a thin functional layer (oxide, nitride, or a molecularly engineered surface) that provides tailored surface energy and epitaxial compatibility.

Fabrication and surface engineering follow standard deposition and treatment steps. The base is cleaned and prepared, the polymer interlayer is applied by spin-coating or lamination and cured, and the top layer is deposited by atomic layer deposition, sputtering, or chemical vapor deposition. Surface functionalization can be performed to promote adhesion or selective growth of target films.

Applications for Substratow1 include research on thin-film solar cells, oxide electronics, catalysis studies, and biosensing platforms. It supports improved film uniformity, reduced defect densities, and enhanced control over interfacial properties.

Variants of Substratow1 exist with different thicknesses and surface roughness targets to suit specific experiments. See also: substrate, epitaxy, thin-film deposition.