Ohutkalvopinnoitus
Ohutkalvopinnoitus is a manufacturing process used to apply a thin layer of material onto a substrate. This layer, known as a thin film, can range in thickness from a few nanometers to several micrometers. The purpose of ohutkalvopinnoitus varies widely, but common goals include improving the surface properties of the substrate, such as hardness, wear resistance, electrical conductivity, optical characteristics, or corrosion resistance. The substrate material can be diverse, including metals, ceramics, polymers, and glass.
Several techniques exist for ohutkalvopinnoitus. Physical vapor deposition (PVD) methods, such as sputtering and evaporation, involve