Monoklorosilaani

Monoklorosilaani is the chemical compound with the formula H3SiCl. It is a colorless gas at room temperature and is a derivative of silane where one hydrogen atom has been replaced by a chlorine atom. It is a highly reactive and pyrophoric substance, meaning it can ignite spontaneously in air. Due to its instability, it is typically handled in inert atmospheres or at low temperatures.

Monoklorosilaani is an important intermediate in the synthesis of silicones and other organosilicon compounds. It can be used in the production of polysilanes and as a precursor for depositing silicon films through chemical vapor deposition (CVD) techniques. Its reactivity stems from the polar Si-Cl bond, making the silicon atom susceptible to nucleophilic attack. It reacts vigorously with water, releasing hydrogen chloride gas and forming silanols, which can further condense. Storage and handling require specialized equipment and strict safety protocols due to its hazardous nature.