Lämpöhöyrystämisen

Lämpöhöyrystäminen, often translated as thermal evaporation, is a widely used physical vapor deposition (PVD) technique. It involves heating a source material to its vaporization temperature in a vacuum or controlled atmosphere, causing it to evaporate and then condense onto a substrate. This process allows for the deposition of thin films of various materials, including metals, oxides, and some alloys, onto surfaces.

The source material can be heated through different methods, such as resistive heating, electron beam evaporation, or induction heating. Resistive heating uses an electric current to heat a filament or crucible containing the source material. Electron beam evaporation employs a focused beam of electrons to melt and vaporize the source. Induction heating uses a high-frequency electromagnetic field to heat a conductive source material.

The substrate is typically placed opposite the source material, and the evaporated particles travel through the vacuum and deposit as a thin, uniform layer on the substrate's surface. The thickness and composition of the deposited film can be controlled by adjusting parameters such as the source material's evaporation rate, substrate temperature, and deposition time.

Lämpöhöyrystäminen is employed in numerous applications, including the fabrication of microelectronic devices, optical coatings, decorative finishes, and protective layers. Its ability to deposit a wide range of materials with good control over film properties makes it a versatile and essential technique in material science and manufacturing.