Ionskæring

Ionskæring, also known as ion milling or ion beam milling, is a material removal process used in the preparation of samples for electron microscopy and other analytical techniques. The process involves the bombardment of a sample surface with a focused beam of ions, typically argon or gallium, which sputter away material from the surface. This technique is particularly useful for creating electron-transparent samples, such as thin sections for transmission electron microscopy (TEM), or for cross-sectional analysis of materials.

The ionskæring process can be performed using a dedicated ion milling machine, which typically includes an ion source, a sample stage, and a vacuum system. The sample is placed on the stage and the ion beam is directed at the surface. The angle of incidence of the ion beam can be adjusted to control the shape and quality of the milled surface. The process is usually carried out at low temperatures to minimize sample damage.

One of the key advantages of ionskæring is its ability to produce extremely flat and damage-free surfaces, which are essential for high-resolution imaging and analysis. The process can also be used to prepare samples with complex geometries, such as thin films on substrates or multilayer structures. However, the technique can be time-consuming and may introduce artifacts if not properly controlled.

In summary, ionskæring is a versatile and powerful technique for sample preparation in materials science and related fields. Its ability to produce high-quality, damage-free surfaces makes it an invaluable tool for electron microscopy and other analytical techniques.