Höyrypinnoituksessa

Höyrypinnoitus, also known as vapor deposition, is a broad class of manufacturing processes used to produce thin films. In these processes, a vapor is created and then deposited onto a substrate. The vapor can be generated by a variety of methods, including evaporation, sputtering, or chemical reactions. The film then grows on the substrate as the vapor condenses or reacts.

There are two main categories of vapor deposition: physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD processes involve the physical transfer of material from a source to the substrate. Examples include vacuum evaporation, where a material is heated in a vacuum until it evaporates, and sputtering, where ions are used to bombard a target material, ejecting atoms that then deposit on the substrate. CVD processes, on the other hand, involve chemical reactions in the vapor phase that lead to the deposition of a solid film on the substrate. These reactions typically occur at elevated temperatures.

Höyrypinnoitus is used in a wide range of applications. It is crucial in the semiconductor industry for creating the intricate layers of electronic devices. It is also employed to produce optical coatings for lenses and mirrors, protective coatings for tools and mechanical parts to enhance wear resistance, and decorative coatings for consumer products. The precise control over film thickness and composition achievable through vapor deposition makes it a vital technique in advanced manufacturing.