Elektronisuihkuhöyrystys
Elektronisuihkuhöyrystys, often abbreviated as E-beam evaporation, is a physical vapor deposition (PVD) technique used for thin film deposition. In this process, a high-energy electron beam is directed at a solid source material, typically in a vacuum chamber. The electron beam causes the surface of the source material to heat up intensely, leading to evaporation or sublimation without significantly heating the rest of the material or the substrate.
The evaporated material then travels through the vacuum and condenses onto a substrate, forming a thin film.
This method is known for its ability to deposit refractory materials with high melting points, such as