ALDteknologialla
ALDteknologialla refers to the application of Atomic Layer Deposition (ALD) technology. ALD is a thin-film deposition technique that allows for the precise control of film thickness at the atomic level. It operates on the principle of sequential, self-limiting surface reactions. In an ALD process, precursors are introduced into a reaction chamber one at a time, separated by inert gas purges. Each precursor reacts with the surface of the substrate to form a monolayer. This process is repeated until the desired film thickness is achieved. The self-limiting nature of the reactions ensures that ALD can deposit highly conformal films over complex three-dimensional structures with excellent uniformity.
This technology is widely used in various industries, including semiconductors, where it is crucial for fabricating