Overlayvac

Overlayvac is a term used in the field of vacuum technology to describe a vacuum system that is designed to operate on top of an existing vacuum system. This type of system is often used in applications where a secondary vacuum is required to achieve specific process conditions, such as in semiconductor manufacturing or materials processing.

The primary advantage of an overlayvac system is its ability to provide a secondary vacuum environment without the need for a completely separate vacuum chamber. This can result in significant cost savings and reduced space requirements. The system typically consists of a vacuum pump, a control system, and a vacuum port that connects to the existing vacuum system.

One of the key considerations in designing an overlayvac system is the compatibility of the two vacuum systems. The pressure ranges, gas types, and pumping speeds of the two systems must be carefully matched to ensure efficient operation. Additionally, the control system must be capable of managing the two vacuum systems simultaneously to achieve the desired process conditions.

Overlayvac systems are commonly used in applications such as plasma etching, chemical vapor deposition, and physical vapor deposition. In these processes, a secondary vacuum is often required to control the pressure and gas flow during the deposition or etching process. The overlayvac system allows for this secondary vacuum to be achieved without the need for a separate vacuum chamber, resulting in a more efficient and cost-effective process.

In summary, overlayvac is a vacuum system designed to operate on top of an existing vacuum system, providing a secondary vacuum environment for specific applications. It offers cost savings and reduced space requirements, but requires careful consideration of system compatibility and control.