trimethylindium

Trimethylindium is an organometallic compound with the chemical formula In(CH3)3. It is a colorless liquid that is highly reactive and pyrophoric, meaning it ignites spontaneously in air. Trimethylindium is primarily used as a precursor in the chemical vapor deposition (CVD) process for the growth of indium-containing thin films, such as indium phosphide (InP) and indium arsenide (InAs). These films are used in various applications, including high-speed electronics, optoelectronics, and photovoltaics.

The compound is typically synthesized by the reaction of indium metal with trimethylaluminum (TMA) or trimethylgallium (TMG) in a suitable solvent. The reaction proceeds via a transmetalation process, where the methyl groups are transferred from the alkylating agent to the indium metal.

Trimethylindium is highly toxic and should be handled with extreme care. It is a potent irritant and can cause severe skin and eye damage. Inhalation of the compound can lead to respiratory irritation and, in severe cases, pulmonary edema. Due to its toxicity and reactivity, trimethylindium is typically handled in a glovebox under an inert atmosphere to minimize exposure.

In summary, trimethylindium is a reactive and toxic organometallic compound used as a precursor in the CVD process for the growth of indium-containing thin films. Its synthesis involves a transmetalation reaction, and it should be handled with extreme care due to its toxicity and reactivity.