duv

Duv stands for deep ultraviolet, the portion of the ultraviolet spectrum with wavelengths shorter than about 280 nanometers. In scientific and industrial contexts, DUV typically refers to radiation in the range roughly from 100 to 280 nm, with most practical applications concentrated near 190–260 nm. Because this part of the spectrum is strongly absorbed by air and by common window materials, DUV radiation is usually produced in vacuum or in nitrogen-purged environments and transmitted through specialized optics.

Common DUV light sources include excimer lasers, notably argon fluoride (ArF) at 193 nm and krypton fluoride (KrF) at 248 nm, and, in the far DUV, fluorine lasers around 157 nm; continuous sources include deuterium lamps and synchrotron radiation. Optical components for DUV use materials such as fused silica (quartz), magnesium fluoride, and calcium fluoride, with coatings optimized for low absorption at target wavelengths.

Major applications are in semiconductor manufacturing, where 193 nm immersion lithography has been used for patterning at advanced nodes. DUV lithography relies on short wavelengths to resolve tiny features, but parts of the industry have shifted toward extreme ultraviolet (EUV) photolithography around 13.5 nm as process nodes advance. Beyond lithography, DUV is employed in spectroscopy, surface science studies, and precision photochemistry, as well as some disinfection and sterilization processes within the UV-C band.

Safety concerns: DUV exposure can cause eye and skin injury, and air can generate reactive ozone; appropriate shielding, enclosures, and personal protective equipment are used.