Trimetüülalumiinium

Trimetüülalumiinium, also known as trimethylaluminum or TMA, is an organoaluminium compound with the chemical formula Al(CH3)3. It is a colorless, flammable liquid at room temperature and pressure. TMA is a highly reactive substance and is pyrophoric, meaning it ignites spontaneously when exposed to air. It is also sensitive to moisture and reacts violently with water.

The primary use of trimetüülalumiinium is as a precursor in the production of semiconductors, particularly in the Metalorganic Vapor Phase Epitaxy (MOVPE) or Metalorganic Chemical Vapor Deposition (MOCVD) processes. It is used to deposit thin films of aluminum-containing compounds, such as aluminum oxide (Al2O3) and aluminum nitride (AlN), which are crucial components in microelectronic devices like transistors and LEDs. TMA also finds applications as a catalyst in polymerization reactions, such as the production of polyethylene.

Trimetüülalumiinium is synthesized by the reaction of aluminum metal with methyl chloride in the presence of a catalyst, or by the reaction of aluminum with methyl halide and sodium or lithium. Due to its hazardous nature, TMA is handled with extreme care under inert atmosphere conditions, typically using glove boxes or specialized Schlenk lines. Proper safety precautions, including the use of personal protective equipment and fire suppression systems, are essential when working with this compound.