UVLaser

UVLaser refers to lasers that emit ultraviolet radiation, typically in the 100 to 400 nanometer range. The short wavelengths provide high photon energy, enabling precise ablation, rapid photochemical effects, and high-resolution material processing. UV lasers come from several families, each with distinct advantages and limitations.

Common technologies include excimer lasers, which use short-lived dimer molecules such as argon fluoride (ArF, 193 nm), krypton fluoride (KrF, 248 nm), and xenon chloride (XeCl, 308 nm). These lasers are typically pulsed and deliver high-energy UV pulses suitable for fine surface modification and micromachining. Solid-state sources generate UV light through nonlinear frequency conversion of visible or near-IR lasers, producing wavelengths such as 266 nm (fourth harmonic of Nd:YAG at 1064 nm) and 355 nm (third harmonic). Rare deep-UV systems, such as fluorine-based F2 lasers at around 157 nm, have specialized uses in research and lithography but require complex optics and gas handling.

Applications are diverse. In semiconductor manufacturing, UV lasers have been central to photolithography and microlithography, enabling pattern transfer at small feature sizes. In medicine, excimer lasers at 193 nm are used for corneal refractive surgery (LASIK and related procedures). UV lasers also support micromachining, optical data storage, spectroscopy, and photochemistry, where deep-UV photons drive photochemical reactions and high-precision material removal.

Safety and practical considerations are prominent. UV radiation can cause eye and skin damage, and many UV systems rely on gas mixtures or specialized optics that degrade under UV exposure. Shielded enclosures, appropriate eyewear, and careful handling of gases and high voltages are required. The optics and materials for UV systems are often more sensitive to damage and aging than those for visible or IR lasers, contributing to higher maintenance and operating costs.